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SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - Positive-Working Polyimide Resists Based On Diazonaphthoquinone Photochemistry
Moss, Mary G., Cuzmar, Ruth M., Brewer, Terry, Reichmanis, ElsaVolume:
1086
Year:
1989
Language:
english
DOI:
10.1117/12.953052
File:
PDF, 3.10 MB
english, 1989