SPIE Proceedings [SPIE 1986 Microlithography Conferences - Santa Clara (Monday 10 March 1986)] Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V - Submicron Proximity Correction By The Fourier Precompensation Method
Haslam, Michael E., McDonald, John F., Blais, Phillip D.Volume:
632
Year:
1986
Language:
english
DOI:
10.1117/12.963667
File:
PDF, 4.07 MB
english, 1986