SPIE Proceedings [SPIE Hague International Symposium - The Hague, Netherlands (Monday 30 March 1987)] Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection - Registration Accuracy And Critical Dimension Control For A 5X Reduction Stepper With Magnification Control
van Hout, F. J., van den Brink, M. A., Wittekoek, S., Coolsen, J. F., Stover, Harry L., Wittekoek, StefanVolume:
811
Year:
1987
Language:
english
DOI:
10.1117/12.975604
File:
PDF, 4.29 MB
english, 1987