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SPIE Proceedings [SPIE Photomask and NGL Mask Technology XIX - Yokohama, Japan (Tuesday 17 April 2012)] Photomask and Next-Generation Lithography Mask Technology XIX - The quality assurance of EUV mask pattern based on 3D-SEM and lithography simulation
Yamanaka, Eiji, Morishita, Keiko, Takaki, Takamasa, Takahashi, Masanori, Hirano, Takashi, Itoh, Masamitsu, Nojima, Shigeki, Hayashi, Naoya, Kato, KokoroVolume:
8441
Year:
2012
Language:
english
DOI:
10.1117/12.979703
File:
PDF, 1.15 MB
english, 2012