An Automatic System Using Mobile-Agent Software to Model the Calculation Process of a Chemical Vapor Deposition Film Deposition Simulator
Takahashi, Takahiro, Fukui, Noriyuki, Arakawa, Masamoto, Funatsu, Kimito, Ema, YoshinoriVolume:
11
Language:
english
Journal:
Journal of Nanoscience and Nanotechnology
DOI:
10.1166/jnn.2011.5104
Date:
September, 2011
File:
PDF, 1.01 MB
english, 2011