Patterning: High Aspect Ratio Sub-15 nm Silicon Trenches...

Advanced Materials 2012 / 11 Vol. 24; Iss. 42

Patterning: High Aspect Ratio Sub-15 nm Silicon Trenches From Block Copolymer Templates (Adv. Mater. 42/2012)

Gu, Xiaodan, Liu, Zuwei, Gunkel, Ilja, Chourou, S. T., Hong, Sung Woo, Olynick, Deirdre L., Russell, Thomas P.
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Volume:
24
Journal:
Advanced Materials
DOI:
10.1002/adma.201290259
Date:
November, 2012
File:
PDF, 1.54 MB
2012
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