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ChemInform Abstract: Tungsten Silicide Films Deposited by SiH2Cl2-WF6 Chemical Reaction.
HARA, T., MIYAMOTO, T., YOKOYAMA, T.Volume:
20
Journal:
ChemInform
DOI:
10.1002/chin.198933342
Date:
August, 1989
File:
PDF, 121 KB
1989