Charge storage phenomenon derived from composition...

Charge storage phenomenon derived from composition redistribution for single Hf 0.8 Si 0.2 O x film after high-temperature treatment

Tang, Zhenjie, Li, Rong, Zhang, Xiwei, Hu, Dan
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Volume:
31
Language:
english
Journal:
Semiconductor Science and Technology
DOI:
10.1088/0268-1242/31/5/055009
Date:
May, 2016
File:
PDF, 2.04 MB
english, 2016
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