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Ion implantation to improve mechanical and electrical properties of resistive materials based on ruthenium dioxide
A. V. Byeli, S. K. Shykh, V. P. BeresinaVolume:
7
Language:
english
Pages:
4
DOI:
10.1007/bf00180779
Date:
December, 1996
File:
PDF, 795 KB
english, 1996