[IEEE 2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Saratoga Springs, NY, USA (2016.5.16-2016.5.19)] 2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Reduction of “Dark-Gate” defects in replacement-metal-gate process and middle-of-line contacts for advanced planar CMOS and FinFET technology
Peng, Wen Pin, Chi, Min-HwaYear:
2016
Language:
english
DOI:
10.1109/asmc.2016.7491160
File:
PDF, 515 KB
english, 2016