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SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III - Process latitude study of focused ion-beam-deposited gold for clear x-ray mask repair
Blauner, Patricia G., Dubner, Andrew D., Wagner, Alfred, Patterson, David O.Volume:
1924
Year:
1993
Language:
english
DOI:
10.1117/12.146496
File:
PDF, 635 KB
english, 1993