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SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Plasma polymerized organosilane network polymers: high-performance resists for positive- and negative-tone deep-UV lithography
Joubert, Olivier P., Joshi, Ajey M., Weidman, Timothy W., Lee, J. T., Taylor, Gary N., Nalamasu, OmkaramVolume:
2195
Year:
1994
Language:
english
DOI:
10.1117/12.175352
File:
PDF, 390 KB
english, 1994