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SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV - Supporting early development of advanced high-performance logic with synchrotron orbital radiation lithography: a feasibility evaluation
Liebmann, Lars W., Pomerene, Andrew T., DeMay, Daniel J., Lamberti, Angela C., Donohue, Thomas P., Burghartz, Joachim N., Patterson, David O.Volume:
2194
Year:
1994
Language:
english
DOI:
10.1117/12.175816
File:
PDF, 1.42 MB
english, 1994