SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV - 22-nm overlay accuracy of synchrotron radiation stepper using an improved chromatic bifocus alignment system
Hamada, Shiro, Ito, Kazuhiro, Miyatake, Tsutomu, Sato, Fumiaki, Yamazaki, Kazunori, Patterson, David O.Volume:
2194
Year:
1994
Language:
english
DOI:
10.1117/12.175832
File:
PDF, 632 KB
english, 1994