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SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Integrated Circuit Metrology, Inspection, and Process Control IV - On-line state and model parameter identification of the positive optical photoresist development process
Carroll, Thomas A., Ramirez, W. Fred, Arnold, William H.Volume:
1261
Year:
1990
Language:
english
DOI:
10.1117/12.20075
File:
PDF, 537 KB
english, 1990