SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 10 September 2013)] Photomask Technology 2013 - Analysis of EUV mask durability under various absorber etch conditions
Lee, Dong Wook, Jo, Sang Jin, Oh, Sung Hyun, Ha, Tae Joong, Kim, Sang Pyo, Yim, Dong Gyu, Faure, Thomas B., Ackmann, Paul W.Volume:
8880
Year:
2013
Language:
english
DOI:
10.1117/12.2026206
File:
PDF, 667 KB
english, 2013