SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Design-Process-Technology Co-optimization for Manufacturability VIII - Resist profile aware source mask optimization
Sturtevant, John L., Capodieci, Luigi, Chen, Ao, Foong, Yee Mei, Hsieh, Michael, Khoh, Andrew, Hsu, Stephen, Feng, Mu, Qiu, Jianhong, Aquino, ChrisVolume:
9053
Year:
2014
Language:
english
DOI:
10.1117/12.2046252
File:
PDF, 985 KB
english, 2014