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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - 20nm MOL overlay case study
Cain, Jason P., Sanchez, Martha I., Subramany, Lokesh, Hsieh, Michael, Li, Chen, Koh, Hui Peng, Cho, David, Golotsvan, Anna, Ramanathan, Vidya, Karur Shanmugam, Ramkumar, Yap, LipkongVolume:
9050
Year:
2014
Language:
english
DOI:
10.1117/12.2046598
File:
PDF, 937 KB
english, 2014