SPIE Proceedings [SPIE Photomask Japan 2014 - Yokohama, Japan (Tuesday 15 April 2014)] Photomask and Next-Generation Lithography Mask Technology XXI - Etched multilayer mask is better than conventional absorber mask
Kato, Kokoro, Kim, Guk-Jin, Oh, Hye-Keun, Kim, In-Seon, Yeung, Michael, Barouch, EytanVolume:
9256
Year:
2014
Language:
english
DOI:
10.1117/12.2069885
File:
PDF, 517 KB
english, 2014