SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Advances in Resist Technology and Processing XII - Characterization and modeling of a chemically amplified resist for ArF lithography
Hutchinson, John M., Wallraff, Gregory M., Hinsberg, William D., Opitz, Juliann, Oldham, William G., Allen, Robert D.Volume:
2438
Year:
1995
Language:
english
DOI:
10.1117/12.210397
File:
PDF, 368 KB
english, 1995