SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Advances in Resist Technology and Processing XII - Design, synthesis and characterization of poly(trimethylsilylmethyl methacrylate-co-chloromethyl styrene) for 193-nm exposure
Smith, Bruce W., Mixon, David A., Novembre, Anthony E., Butt, Shahid A., Allen, Robert D.Volume:
2438
Year:
1995
Language:
english
DOI:
10.1117/12.210400
File:
PDF, 668 KB
english, 1995