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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Etched-multilayer black border formed on EUV mask: Does it cause image degradation during pattern inspection using EB optics?
Panning, Eric M., Goldberg, Kenneth A., Amano, Tsuyoshi, Iida, Susumu, Hirano, Ryoichi, Abe, Tsukasa, Morikawa, Yasutaka, Watanabe, HidehiroVolume:
9776
Year:
2016
Language:
english
DOI:
10.1117/12.2218940
File:
PDF, 1.28 MB
english, 2016