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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Benchmarking study of EUV resists for NXE:3300B
Panning, Eric M., Goldberg, Kenneth A., Fan, Yu-Jen, Mellish, Mac, Chun, Jun Sung, McWilliams, Scott, Montgomery, Cecilia, Montgomery, WarrenVolume:
9776
Year:
2016
Language:
english
DOI:
10.1117/12.2222065
File:
PDF, 7.61 MB
english, 2016