SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Metrology, Inspection, and Process Control for Microlithography X - Multiparameter CD measurements using scatterometry
Raymond, Christopher J., Murnane, Michael R., Prins, Steven L., Naqvi, S. Sohail H., McNeil, John R., Hosch, Jimmy W., Jones, Susan K.Volume:
2725
Year:
1996
Language:
english
DOI:
10.1117/12.240121
File:
PDF, 415 KB
english, 1996