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SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Metrology, Inspection, and Process Control for Microlithography X - Efficient workstation-based 3D model for optical alignment simulation
Lucas, Kevin D., Yuan, Chi-Min, Strojwas, Andrzej J., Jones, Susan K.Volume:
2725
Year:
1996
Language:
english
DOI:
10.1117/12.240139
File:
PDF, 452 KB
english, 1996