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SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Optical Microlithography IX - Mathematical and CAD framework for proximity correction
Cobb, Nicolas B., Zakhor, Avideh, Miloslavsky, Eugene A., Fuller, Gene E.Volume:
2726
Year:
1996
Language:
english
DOI:
10.1117/12.240907
File:
PDF, 487 KB
english, 1996