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SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - New process for resist removal after lithography process using adhesive tape
Kubozono, Tatsuya, Moroishi, Yutaka, Ohta, Yoshio, Shimodan, Hideaki, Moriuchi, Noboru, Kunz, Roderick R.Volume:
2724
Year:
1996
Language:
english
DOI:
10.1117/12.241866
File:
PDF, 806 KB
english, 1996