SPIE Proceedings [SPIE Symposium on Photomask and X-Ray Mask Technology - Kawasaki City, Japan (Thursday 18 April 1996)] Photomask and X-Ray Mask Technology III - Study on x-ray irradiation stability of absorber materials for x-ray masks by stress measurement
Ashikaga, Kinya, Tsuboi, Shinji, Yamashita, Yoshio, Sugihara, Shinji, Gomei, Yoshio, Shoki, Tsutomu, Yamaguchi, Yoichi, Ohta, Tsuneaki, Yoshihara, HideoVolume:
2793
Year:
1996
Language:
english
DOI:
10.1117/12.245200
File:
PDF, 317 KB
english, 1996