SPIE Proceedings [SPIE Micromachining and Microfabrication '96 - Austin, TX (Monday 14 October 1996)] Microlithography and Metrology in Micromachining II - Beamline and exposure station for deep x-ray lithography at the advanced photon source
Lai, Barry P., Mancini, Derrick C., Yun, Wenbing, Gluskin, Efim S., Postek, Jr., Michael T., Friedrich, Craig R.Volume:
2880
Year:
1996
Language:
english
DOI:
10.1117/12.250948
File:
PDF, 256 KB
english, 1996