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SPIE Proceedings [SPIE Microelectronic Manufacturing - Austin, TX (Wednesday 1 October 1997)] Microelectronic Device Technology - Si selective epitaxial growth technology using UHV-CVD and its application to LSI fabrication
Shishiguchi, Seiichi, Yasunaga, Tomoko, Aoyama, Tohru, Tatsumi, T., Saito, Shuichi, Rodder, Mark, Tsuchiya, Toshiaki, Burnett, David, Wristers, DirkVolume:
3212
Year:
1997
Language:
english
DOI:
10.1117/12.284582
File:
PDF, 764 KB
english, 1997