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SPIE Proceedings [SPIE 17th Annual BACUS Photomask Technology and Management - Redwood City, CA (Wednesday 17 September 1997)] 17th Annual BACUS Symposium on Photomask Technology and Management - Clear-field reticle defect disposition for advanced sub-half-micron lithography
Ibsen, Kent B., Ilzhoefer, John R., Eickhoff, Mark D., Reynolds, James A., Grenon, Brian J.Volume:
3236
Year:
1998
Language:
english
DOI:
10.1117/12.301182
File:
PDF, 712 KB
english, 1998