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SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Metrology, Inspection, and Process Control for Microlithography XII - Manufacturability of subwavelength features using reticle and substrate enhancements
McCallum, Martin, Lucas, Kevin D., Maltabes, John G., Kling, Michael E., Singh, BhanwarVolume:
3332
Year:
1998
Language:
english
DOI:
10.1117/12.308748
File:
PDF, 1.18 MB
english, 1998