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SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Emerging Lithographic Technologies II - Photomask in-plane distortion induced during e-beam patterning
Shamoun, Bassam, Sprague, Michael A., Engelstad, Roxann L., Cerrina, Franco, Vladimirsky, YuliVolume:
3331
Year:
1998
Language:
english
DOI:
10.1117/12.309581
File:
PDF, 1012 KB
english, 1998