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SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Optical Microlithography XI - New method for optical proximity correction with gray-level serifs
Du, Jinglei, Huang, Qizhong, Guo, Yongkang, Cui, Zheng, Van den Hove, LucVolume:
3334
Year:
1998
Language:
english
DOI:
10.1117/12.310722
File:
PDF, 335 KB
english, 1998