SPIE Proceedings [SPIE Microelectronic Manufacturing Technologies - Edinburgh, United Kingdom (Wednesday 19 May 1999)] Lithography for Semiconductor Manufacturing - Performance of 193-nm resists based on alicyclic methacrylate and cyclo-olefin systems
Padmanaban, Munirathna, Cook, Michelle M., Durham, Dana L., Khanna, Dinesh N., Klauck-Jacobs, Axel, Oberlander, Joseph E., Rahman, M. D., Dammel, Ralph R., Mack, Chris A., Stevenson, TomVolume:
3741
Year:
1999
Language:
english
DOI:
10.1117/12.346883
File:
PDF, 2.79 MB
english, 1999