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SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Novel hardening methods of DUV chemically amplified photoresist by ion implantation and its application to new organic ARC material and bilayer process
Chun, Jun-Sung, Kim, Hung-Eil, Barnett, Stanley, Shih, James, Conley, WillVolume:
3678
Year:
1999
Language:
english
DOI:
10.1117/12.350190
File:
PDF, 1.10 MB
english, 1999