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SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Process characterization of 100-μm-thick photoresist films
Flack, Warren W., White, Sylvia, Todd, Bradley, Conley, WillVolume:
3678
Year:
1999
Language:
english
DOI:
10.1117/12.350230
File:
PDF, 1.94 MB
english, 1999