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SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Metrology, Inspection, and Process Control for Microlithography XIII - Application of model-based lithographic process control for cost-effective IC manufacturing at 0.13 μm and beyond
Monahan, Kevin M., Lord, Patrick J., Hayzelden, Clive, Ng, Waiman, Singh, BhanwarVolume:
3677
Year:
1999
Language:
english
DOI:
10.1117/12.350830
File:
PDF, 2.47 MB
english, 1999