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SPIE Proceedings [SPIE SPIE's International Symposium on Optical Science, Engineering, and Instrumentation - Denver, CO (Sunday 18 July 1999)] Engineered Nanostructural Films and Materials - Optical superlattices as phase-shift masks for microlithography
Carcia, Peter F., French, Roger H., Reynolds, Gillian A. M., Hughes, Greg P., Torardi, Charlie C., Reilly, M. H., Lemon, M. F., Miao, C. R., Jones, David J., Wilson, L., Dieu, Laurent, Lakhtakia, AkhlVolume:
3790
Year:
1999
Language:
english
DOI:
10.1117/12.351257
File:
PDF, 1.46 MB
english, 1999