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SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Optical Microlithography XII - Higher-order aberration measurement with printed patterns under extremely reduced sigma illumination
Nomura, Hiroshi, Tawarayama, Kazuo, Kohno, Takuya, Van den Hove, LucVolume:
3679
Year:
1999
Language:
english
DOI:
10.1117/12.354348
File:
PDF, 682 KB
english, 1999