SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Optical Microlithography XII - Imaging contrast improvement for 160-nm line features using subresolution assist features with binary, six percent ternary attenuated phase-shift mask with process-tuned resist
Kachwala, Nishrin, Petersen, John S., Chen, J. Fung, Canjemi, Mike, McCallum, Martin, Van den Hove, LucVolume:
3679
Year:
1999
Language:
english
DOI:
10.1117/12.354366
File:
PDF, 2.44 MB
english, 1999