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SPIE Proceedings [SPIE Photomask and X-Ray Mask Technology VI - Yokohama, Japan (Tuesday 13 April 1999)] Photomask and X-Ray Mask Technology VI - Mask manufacturability issues for subwavelength lithography
Karklin, Linard, Rachlin, Kenneth E., Morimoto, HiroakiVolume:
3748
Year:
1999
Language:
english
DOI:
10.1117/12.360256
File:
PDF, 312 KB
english, 1999