SPIE Proceedings [SPIE Photomask Technology and Management - Monterey, CA (Wednesday 15 September 1999)] 19th Annual Symposium on Photomask Technology - Absorbing assist pattern technique (A2PT) for effective sidelobe control for attenuated phase-shifting masks in optical projection lithography
Pforr, Rainer, Gans, Fritz, Knobloch, Juergen, Thiele, Joerg, Abboud, Frank E., Grenon, Brian J.Volume:
3873
Year:
1999
Language:
english
DOI:
10.1117/12.373289
File:
PDF, 623 KB
english, 1999