SPIE Proceedings [SPIE Photomask Technology and Management - Monterey, CA (Wednesday 15 September 1999)] 19th Annual Symposium on Photomask Technology - Process optimization of e-beam lithography with high-accelerated voltage
Yoshida, Jun, Takagi, Noriaki, Tsuzuki, Masayoshi, Takahashi, Naoki, Yamada, Yoshiro, Matsuzawa, Yuichi, Abboud, Frank E., Grenon, Brian J.Volume:
3873
Year:
1999
Language:
english
DOI:
10.1117/12.373340
File:
PDF, 2.43 MB
english, 1999