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SPIE Proceedings [SPIE Photomask Technology and Management - Monterey, CA (Wednesday 15 September 1999)] 19th Annual Symposium on Photomask Technology - Extension of graybeam writing for the 130-nm technology node
Chabala, Jan M., Abboud, Frank E., Sauer, Charles A., Weaver, Suzanne, Lu, Maiying, Pearce-Percy, Henry T., Hofmann, Ulrich, Vernon, Matthew, Ton, Dinh, Cole, Damon M., Naber, Robert J., Abboud, FrankVolume:
3873
Year:
1999
Language:
english
DOI:
10.1117/12.373345
File:
PDF, 1.25 MB
english, 1999