![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - Practical software design and experimental research of attenuated phase-shifting masks
Zhou, Chongxi, Feng, Boru, Hou, Desheng, Zhang, Jin, Progler, Christopher J.Volume:
4000
Year:
2000
Language:
english
DOI:
10.1117/12.388958
File:
PDF, 1.43 MB
english, 2000