SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Emerging Lithographic Technologies IV - Investigation of proximity effect correction in electron projection lithography (EPL)
Okino, Teruaki, Suzuki, Kazuaki, Okamoto, Kazuya, Kawata, Shintaro, Uchikawa, Kiyoshi, Suzuki, Syouhei, Shimizu, Sumito, Fujiwara, Tomoharu, Yamada, Atsushi, Kamijo, Koichi, Dobisz, Elizabeth A.Volume:
3997
Year:
2000
Language:
english
DOI:
10.1117/12.390059
File:
PDF, 1.21 MB
english, 2000