SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VII - Kanagawa, Japan (Wednesday 12 April 2000)] Photomask and Next-Generation Lithography Mask Technology VII - Reticle defect sizing of optical proximity correction defects using SEM imaging and image analysis techniques
Zurbrick, Larry S., Wang, Lantian, Konicek, Paul, Laird, Ellen R., Morimoto, HiroakiVolume:
4066
Year:
2000
Language:
english
DOI:
10.1117/12.392037
File:
PDF, 2.24 MB
english, 2000