SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VII - Kanagawa, Japan (Wednesday 12 April 2000)] Photomask and Next-Generation Lithography Mask Technology VII - Evaluation of loading effect of NLD dry etching
Iwamatsu, Takayuki, Fujisawa, Tatsuya, Hiruta, Koji, Morimoto, Hiroaki, Harashima, Noriyuki, Sasaki, Takaei, Hara, Mutsumi, Yamashiro, Kazuhide, Okubo, Yasushi, Takehana, Yoichi, Morimoto, HiroakiVolume:
4066
Year:
2000
Language:
english
DOI:
10.1117/12.392060
File:
PDF, 2.91 MB
english, 2000