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SPIE Proceedings [SPIE Microelectronic Manufacturing - Santa Clara, CA (Monday 18 September 2000)] Process Control and Diagnostics - Feasibility and applicability of integrated metrology using spectroscopic ellipsometry in a cluster tool
Boher, Pierre, Pickering, Christopher, Tarnowka, Alexandre, Piel, Jean-Philippe, Evrard, Patrick, Stehle, Jean-Louis P., Miller, Michael L., Ashtiani, Kaihan A.Volume:
4182
Year:
2000
Language:
english
DOI:
10.1117/12.410067
File:
PDF, 338 KB
english, 2000